Advantages Of R05200 Tantalum Plate
R05200 is a pure tantalum material (UNS R05200) that meets the ASTM B708 standard and offers the following core benefits:
1. Excellent corrosion resistance
It has excellent performance in high-temperature and strong acids (such as hydrochloric acid, sulfuric acid, nitric acid) and chloride environments, and its corrosion resistance exceeds that of titanium and Hastelloy.
Resistant to aqua regia corrosion, suitable for extreme chemical environments (e.g. concentrated sulfuric acid evaporators).
2. Biocompatibility
ISO 10993 certified, non-toxic, non-allergenic, widely used in orthopedic implants (e.g. bone nails, skull repair plates).
3. High Temperature Stability
With a melting point of 2996°C, it can be used for a long time at 600°C and can withstand a plasma environment of 2000°C (e.g. rocket nozzle lining) for a short time.
4. Excellent Physical Properties
High thermal conductivity (57.5 W/m·K) and electrical conductivity (resistivity 13.5 μΩ·cm) for high-power capacitors.
Low coefficient of thermal expansion (6.5×10⁻⁶/K) ensures dimensional stability in high-temperature environments.
5. Processing Adaptability
Elongation of up to 25% after cold rolling enables complex stamping (e.g. thin-walled reactor linings).
Processing Technology Of R05200 Tantalum Plate
1. Cold Forming
Rolling: multi-pass cold rolling (deformation ≤30% per pass), intermediate annealing (1000-1200°C/vacuum).
Stamping: The die gap is controlled at 5-8% of the plate thickness to avoid edge cracking.
2. Welding
Electron beam welding: vacuum environment (≤1×10⁻³ Pa), power density 3×10⁴ W/cm², aspect ratio up to 20:1.
TIG welding: argon purity ≥ 99.999%, argon protection is required on the back side, and R05200 matching components are used for welding wires.
3. Heat Treatment
Recrystallization annealing: 1200°C×1h (vacuum≤5×10⁻³ Pa), grain size control ASTM grade 6-8.
4. Machining
Tools: diamond-coated carbide with rake angle 10-15° and rear angle 6-8°.
Parameters: linear speed ≤ 30m/min, feed 0.05-0.1mm/r, emulsion cooling (pH neutral).
R05200 Tantalum Plate Typical Application Fields And Cases
| Application Fields |
Specific Application |
Performance Requirements |
Case Specifications
|
|
Chemical Equipment |
Reactor Lining, Condenser Tube |
160°C Concentrated Culfuric Acid Corrosion Resistance |
Thk 3mmx2000×1000mm |
|
Electronics Industry |
High Specific Capacitance Capacitor Anode |
Surface Roughness Ra ≤ 0.2μm |
0.1mm Tantalum Foil, Capacitance 100,000μF/g |
|
Medical Implantation |
Skull Repair Plate, Vascular Stent |
ASTM F560 |
Thk 1.5mm , 30% Porosity Porous Structure |
|
Aerospace Industry |
Rocket Nozzle Throat Lining, Satellite Thermal Control Components |
3000°C Instantaneous High Temperature Resistance |
C103 Coating Composite Structure, Thk 5mm |
|
Vacuum Equipment |
Sputtering Target, Single Crystal Furnace Heater |
Purity≥ 99.95%, Grain Size ≤ 50μm |
Φ300mm Target, 16.6g/cm³ |
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